Sputtering
While there are many different types of plasma sputtering processes, all with different power supply demands, one of the most important requirements for almost all of them is response to arcing. This is important for stable and consistent sputtering processes. Spellman has many years of experience optimizing our standard rackmount and modular power supplies for use in sputtering, for instance, by limiting stored energy and tailoring arc recovery times. Due to the wide range of requirements for plasma sputtering power supplies, we encourage you to contact our applications experts to discuss your unique specifications.
- Output Voltages from 5kV to 10kV
- Output Power 3kW, 6kW and 12kW
- Designed for E Beam Coating Applications
- Fast, User Configurable Dynamic Arc Intervention
- Optional Filament Gun Supply (up to 3 channels)
- Models from 1kV to 225kV
- 12kW in Single 6U (10.5”) Chassis
- Parallel Units for >100kWChassis
- User Configurable Settings Via Ethernet Interface
- Output Voltages from 1kV to 70kV
- Output Power 4 kW
- Single 3U (5.25”) Chassis
- Remote Analog and Remote Ethernet Interface
- User Configurable Settings Via Ethernet Interface
- Output Voltages from 1kV to 150kV
- Output Power 6kW
- Single 6U (10.5”) Chassis
- Remote Analog and Remote Ethernet Interface
- Arc and Short Circuit Protected
- User Configurable Settings Via Ethernet Interface
